NIFT to collaborate with US fashion technology institute

New Delhi: The government  controlled National Institute of Fashion Technology has signed an agreement with New York-based Fashion Institute of Technology (FIT) to run dual-degree programmes.

With this collaboration the "selected meritorious" students from NIFT would avail the unique opportunity to obtain a joint degree awarded both by NIFT and FIT.

"This agreement will be implemented at the earliest for the benefit of NIFT students."

In fact, NIFT was established in 1986 in collaboration with the FIT with assistance from United Nations Development Programme (UNDP). The New Delhi-based institute runs under the textiles ministry.

A delegation from NIFT recently visited the FIT to explore the possible areas of collaboration.

The two institutes have agreed to collaborate in the areas of fashion design, textile design and fashion communication.